CA2037102C - Method of making fused silica - Google Patents

Method of making fused silica

Info

Publication number
CA2037102C
CA2037102C CA002037102A CA2037102A CA2037102C CA 2037102 C CA2037102 C CA 2037102C CA 002037102 A CA002037102 A CA 002037102A CA 2037102 A CA2037102 A CA 2037102A CA 2037102 C CA2037102 C CA 2037102C
Authority
CA
Canada
Prior art keywords
vaporizable
amorphous particles
silicon
halide
metal oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CA002037102A
Other languages
English (en)
French (fr)
Other versions
CA2037102A1 (en
Inventor
Michael Sean Dobbins
Robert Ernest Mclay
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Inc
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=24270461&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=CA2037102(C) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Corning Inc filed Critical Corning Inc
Publication of CA2037102A1 publication Critical patent/CA2037102A1/en
Application granted granted Critical
Publication of CA2037102C publication Critical patent/CA2037102C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413Reactant delivery systems
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/14Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415Reactant delivery systems
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01446Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/02Pure silica glass, e.g. pure fused quartz
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/08Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/10Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with boron
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/20Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/28Doped silica-based glasses doped with non-metals other than boron or fluorine doped with phosphorus
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/30Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/30Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/31Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/30Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/32Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with aluminium
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/30Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/34Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/30Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/30Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/30Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/50Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with alkali metals
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/30Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/54Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with beryllium, magnesium or alkaline earth metals
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/04Multi-nested ports
    • C03B2207/06Concentric circular ports
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/30For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32Non-halide
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/50Multiple burner arrangements
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/50Multiple burner arrangements
    • C03B2207/52Linear array of like burners
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/80Feeding the burner or the burner-heated deposition site
    • C03B2207/85Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Glass Compositions (AREA)
  • Silicon Compounds (AREA)
CA002037102A 1990-08-16 1991-02-26 Method of making fused silica Expired - Fee Related CA2037102C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US568,230 1990-08-16
US07/568,230 US5043002A (en) 1990-08-16 1990-08-16 Method of making fused silica by decomposing siloxanes

Publications (2)

Publication Number Publication Date
CA2037102A1 CA2037102A1 (en) 1992-02-17
CA2037102C true CA2037102C (en) 1997-10-21

Family

ID=24270461

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002037102A Expired - Fee Related CA2037102C (en) 1990-08-16 1991-02-26 Method of making fused silica

Country Status (6)

Country Link
US (2) US5043002A (en])
EP (1) EP0471139B1 (en])
JP (1) JP2683727B2 (en])
CA (1) CA2037102C (en])
DE (1) DE69123659T2 (en])
TW (1) TW224077B (en])

Families Citing this family (138)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5152819A (en) * 1990-08-16 1992-10-06 Corning Incorporated Method of making fused silica
US5231059A (en) * 1990-09-21 1993-07-27 Allied-Signal Inc. Process for preparing black glass using cyclosiloxane precursors
WO1994017003A1 (en) * 1990-09-21 1994-08-04 Allied-Signal Inc. Ceramic fiber reinforced silicon carboxide composite with adjustable dielectric properties
US5266533A (en) * 1991-04-12 1993-11-30 Allied-Signal Inc. Black glass ceramic from rapid pyrolysis in oxygen-containing atmospheres
EP0654016B1 (en) * 1991-04-12 1997-10-29 AlliedSignal Inc. Black glass ceramic from rapid pyrolysis in oxygen-containing atmospheres
JP2588447B2 (ja) * 1991-06-29 1997-03-05 信越石英株式会社 エキシマレーザー用石英ガラス部材の製造方法
US5154744A (en) * 1991-08-26 1992-10-13 Corning Incorporated Method of making titania-doped fused silica
CA2084461A1 (en) * 1991-12-06 1993-06-07 Hiroo Kanamori Method for fabricating an optical waveguide
US5296012A (en) * 1992-12-28 1994-03-22 Corning Incorporated Method of making optical waveguide preforms
US5332702A (en) * 1993-04-16 1994-07-26 Corning Incorporated Low sodium zircon refractory and fused silica process
GB9312634D0 (en) * 1993-06-18 1993-08-04 Tsl Group Plc Improvements in vitreous silica manufacture
US5356451A (en) * 1993-12-20 1994-10-18 Corning Incorporated Method and apparatus for vaporization of liquid reactants
US5558687A (en) * 1994-12-30 1996-09-24 Corning Incorporated Vertical, packed-bed, film evaporator for halide-free, silicon-containing compounds
US5599371A (en) * 1994-12-30 1997-02-04 Corning Incorporated Method of using precision burners for oxidizing halide-free, silicon-containing compounds
US5632797A (en) * 1994-12-30 1997-05-27 Corning Incorporated Method of providing vaporized halide-free, silicon-containing compounds
US5616159A (en) * 1995-04-14 1997-04-01 Corning Incorporated Method of forming high purity fused silica having high resistance to optical damage
EP0747327B2 (en) * 1995-06-07 2003-08-27 Corning Incorporated Method of thermally treating and consolidating silica preforms for reducing laser-induced optical damage in silica
JPH0967138A (ja) * 1995-06-22 1997-03-11 Toshiba Corp 半導体製造用石英及びその製造装置並びに製造方法
US5703191A (en) * 1995-09-01 1997-12-30 Corning Incorporated Method for purifying polyalkylsiloxanes and the resulting products
JP3979666B2 (ja) * 1995-09-12 2007-09-19 コーニング インコーポレイテッド 溶融シリカガラスの製造に於ける、炉、その使用方法及び炉によって製造された光学製品
EP0850202B1 (en) * 1995-09-12 2005-04-27 Corning Incorporated Boule oscillation patterns for producing fused silica glass
EP0850201B1 (en) * 1995-09-12 2003-07-16 Corning Incorporated Containment vessel for producing fused silica glass
CN1052464C (zh) * 1995-11-03 2000-05-17 康宁股份有限公司 抗氢致衰减的光纤
US5838866A (en) 1995-11-03 1998-11-17 Corning Incorporated Optical fiber resistant to hydrogen-induced attenuation
CA2233021A1 (en) * 1995-12-19 1997-06-26 Greg E. Smith Method and apparatus for forming fused silica by combustion of liquid reactants
US6312656B1 (en) * 1995-12-19 2001-11-06 Corning Incorporated Method for forming silica by combustion of liquid reactants using oxygen
US5879649A (en) * 1995-12-19 1999-03-09 Corning Incorporated Method for purifying polyalkylsiloxanes and the resulting products
EP0780345A1 (en) 1995-12-22 1997-06-25 Corning Incorporated Optical element for UV transmission
US5910371A (en) 1996-01-04 1999-06-08 Francel; Josef Composite glass article and method of manufacture
EP0881987A4 (en) * 1996-02-21 1999-05-12 Corning Inc PURE MELTED SILICA, OVEN AND THEIR PRODUCTION
WO1997032821A1 (en) * 1996-03-05 1997-09-12 Corning Incorporated Method of increasing the initial transmittance of optical glass
FR2759465B1 (fr) * 1996-04-30 1999-04-30 Corning Inc Procede de formation d'un circuit optique
US6309991B1 (en) * 1996-08-29 2001-10-30 Corning Incorporated Silica with low compaction under high energy irradiation
JP2000517284A (ja) * 1996-08-29 2000-12-26 コーニング インコーポレイテッド 石英ガラスのレーザ誘起圧密決定方法
JP2001502312A (ja) * 1996-10-08 2001-02-20 コーニング インコーポレイテッド シロキサン原料のゲル化を阻害する方法およびゲル化の阻害された原料
BR9707515A (pt) 1996-12-16 1999-07-27 Corning Inc Estoque de alimentac o de formac o de sílica dopada com germânio e processo
CA2274478A1 (en) * 1996-12-16 1998-06-25 Corning Incorporated Organometallics for lightwave optical circuit applications
US6174509B1 (en) * 1997-02-11 2001-01-16 Corning Incorporated Pure fused silica, furnace and method
EP0973957A4 (en) * 1997-03-07 2004-04-28 Corning Inc PROCESS FOR THE MANUFACTURE OF FUSED SILICA DOPED WITH TITANIUM OXIDE
KR100548198B1 (ko) * 1997-04-18 2006-02-01 코닝 인코포레이티드 실록산의 정제방법
AU743831B2 (en) * 1997-07-08 2002-02-07 Corning Incorporated Germanium chloride and siloxane feedstock for forming silica glass and method
US5979185A (en) * 1997-07-16 1999-11-09 Corning Incorporated Method and apparatus for forming silica by combustion of liquid reactants using a heater
CA2295684A1 (en) * 1997-07-21 1999-01-28 Corning Incorporated Methods and apparatus for producing low flow rates of feedstock vapors
EP1030822B1 (en) * 1997-09-24 2010-06-23 Corning Incorporated FUSED SiO2-TiO2 GLASS METHOD
US6094940A (en) * 1997-10-09 2000-08-01 Nikon Corporation Manufacturing method of synthetic silica glass
JPH11116247A (ja) * 1997-10-09 1999-04-27 Nikon Corp 合成石英ガラス製造方法
WO1999054259A1 (en) * 1998-04-22 1999-10-28 Corning Incorporated Methods for making ultra-low expansion silica-titania glasses
US6546757B1 (en) 1998-07-28 2003-04-15 Brown University Research Foundation Liquid spray pyrolysis method for the fabrication of optical fiber preforms, with reactant mixing
EP0978487A3 (en) 1998-08-07 2001-02-21 Corning Incorporated Sealed, nozzle-mix burners for silica deposition
ZA994171B (en) * 1998-08-07 2000-03-28 Corning Inc Method and apparatus for forming soot for the manufacture of glass.
US6260385B1 (en) 1998-08-07 2001-07-17 Corning Incorporated Method and burner for forming silica-containing soot
US6672106B1 (en) 1998-08-07 2004-01-06 Corning Incorporated Method and apparatus for forming soot for the manufacture of glass
US6574991B1 (en) * 1998-08-13 2003-06-10 Corning Incorporated Pure fused silica, furnace and method
KR20010079889A (ko) * 1998-09-22 2001-08-22 알프레드 엘. 미첼슨 용융 실리카 유리의 보울을 생성하는 버너
US5970751A (en) * 1998-09-22 1999-10-26 Corning Incorporated Fused SiO2 -TiO2 glass method
US6207522B1 (en) * 1998-11-23 2001-03-27 Microcoating Technologies Formation of thin film capacitors
US6336347B1 (en) 1998-12-28 2002-01-08 Pirelli Cavi E Sistemi S.P.A. Process for producing silica by decomposition of an organosilane
ATE303978T1 (de) * 1998-12-28 2005-09-15 Pirelli & C Spa Verfahren zur herstellen von siliciumdioxyd durch zersetzung eines organosilans
US6783898B2 (en) 1999-02-12 2004-08-31 Corning Incorporated Projection lithography photomask blanks, preforms and method of making
US6242136B1 (en) 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6265115B1 (en) 1999-03-15 2001-07-24 Corning Incorporated Projection lithography photomask blanks, preforms and methods of making
US6319634B1 (en) * 1999-03-12 2001-11-20 Corning Incorporated Projection lithography photomasks and methods of making
US6782716B2 (en) * 1999-02-12 2004-08-31 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6682859B2 (en) * 1999-02-12 2004-01-27 Corning Incorporated Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass
US6649268B1 (en) * 1999-03-10 2003-11-18 Nikon Corporation Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member
NO310142B1 (no) * 1999-03-29 2001-05-28 Elkem Materials Fremgangsmåte for fremstilling av amorft silica fra silisium og fra silisiumholdige materialer
US6140546A (en) * 1999-06-04 2000-10-31 Phillips Petroleum Company Hydrocarbon dehydrocyclization process
AU5932500A (en) 1999-07-22 2001-02-13 Corning Incorporated Extreme ultraviolet soft x-ray projection lithographic method and mask devices
JP3766802B2 (ja) 1999-07-22 2006-04-19 コーニング インコーポレイテッド 遠紫外軟x線投影リソグラフィー法システムおよびリソグラフィーエレメント
KR20020029790A (ko) * 1999-09-10 2002-04-19 알프레드 엘. 미첼슨 순수 용융 실리카, 용융로 및 용융방법
US6410192B1 (en) 1999-11-15 2002-06-25 Corning Incorporated Photolithography method, photolithography mask blanks, and method of making
US6176588B1 (en) 1999-12-14 2001-01-23 Corning Incorporated Low cost light weight mirror blank
US6314766B1 (en) * 2000-01-19 2001-11-13 Corning Incorporated Apparatus for minimizing air infiltration in the production of fused silica glass
US6418756B1 (en) 2000-01-28 2002-07-16 Corning Incorporated Method of making planar waveguides using low flow rates of feedstock vapors from a gas and liquid mixture
US6598425B1 (en) 2000-03-08 2003-07-29 Corning Incorporated Method for collecting soot
US20020005051A1 (en) * 2000-04-28 2002-01-17 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
US6403508B1 (en) 2000-05-31 2002-06-11 Corning Incorporated Fused silica with constant induced absorption
US6988378B1 (en) * 2000-07-27 2006-01-24 Corning Incorporated Light weight porous structure
US6387511B1 (en) * 2000-07-27 2002-05-14 Corning Incorporated Light weight porous structure
US6378337B1 (en) * 2000-09-15 2002-04-30 Corning Incorporated Method for producing bulk fused silica
EP1328482A1 (en) * 2000-09-28 2003-07-23 Corning Incorporated Optical glass silica soot particles and method of making same
US6776006B2 (en) 2000-10-13 2004-08-17 Corning Incorporated Method to avoid striae in EUV lithography mirrors
DE60105191D1 (de) * 2000-12-19 2004-09-30 Pirelli & C Spa Abscheidungsbrenner mit mehreren flammen und verfahren zur herstellung von vorformen für optische fasern
EP1358132A4 (en) * 2000-12-21 2004-12-29 Corning Inc FIREPROOF MATERIALS FOR OVENS FOR THE PRODUCTION OF QUARTZ
DE10065028A1 (de) * 2000-12-23 2002-07-18 Degussa Mit Kalium dotierte pyrogene Oxide
US20050120752A1 (en) * 2001-04-11 2005-06-09 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
US6606883B2 (en) * 2001-04-27 2003-08-19 Corning Incorporated Method for producing fused silica and doped fused silica glass
US8047023B2 (en) * 2001-04-27 2011-11-01 Corning Incorporated Method for producing titania-doped fused silica glass
US20020174684A1 (en) * 2001-05-23 2002-11-28 Danielson Paul S. Fused silica furnace and method
JP4165879B2 (ja) * 2001-05-30 2008-10-15 ピレリ・アンド・チ・ソチエタ・ペル・アツィオーニ 気相成長法によりガラス光ファイバ予成型品を製造する方法及び装置
US20030039865A1 (en) * 2001-06-20 2003-02-27 Isonics Corporation Isotopically engineered optical materials
JP4154563B2 (ja) * 2001-07-23 2008-09-24 信越化学工業株式会社 シリカ含有複合酸化物球状微粒子及びその製造方法
JP2003040627A (ja) * 2001-07-30 2003-02-13 Mitsubishi Electric Corp 石英系ガラス用原料及び石英系ガラスの製造方法
JP2005503316A (ja) * 2001-09-27 2005-02-03 コーニング インコーポレイテッド 石英ガラス生産のための改善された方法及び炉
US6763683B2 (en) 2001-10-23 2004-07-20 Corning Incorporated Method for pure, fused oxide
US8037717B2 (en) * 2001-10-26 2011-10-18 Corning Incorporated Methods and apparatus for pulsed doping or drying a soot preform
US20030104209A1 (en) * 2001-11-30 2003-06-05 Bellman Robert A. Precursor and method of growing doped glass films
US6832493B2 (en) * 2002-02-27 2004-12-21 Corning Incorporated High purity glass bodies formed by zero shrinkage casting
US6829908B2 (en) * 2002-02-27 2004-12-14 Corning Incorporated Fabrication of inclusion free homogeneous glasses
US20030159466A1 (en) * 2002-02-27 2003-08-28 Bowden Bradley F. Dry pressing of spray dried soot to make EUV components
DE10211958A1 (de) * 2002-03-18 2003-10-16 Wacker Chemie Gmbh Hochreines Silica-Pulver, Verfahren und Vorrichtung zu seiner Herstellung
FI115134B (fi) * 2002-06-28 2005-03-15 Liekki Oy Menetelmä seostetun lasimateriaalin valmistamiseksi
EP1565400B1 (en) * 2002-11-26 2019-04-10 Cabot Corporation Fumed metal oxide particles and process for producing the same
US7841211B2 (en) * 2002-11-29 2010-11-30 Shin-Etsu Quartz Products Co., Ltd. Production process of synthetic quartz glass
DE10302914B4 (de) * 2003-01-24 2005-12-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
US7329377B2 (en) * 2004-03-12 2008-02-12 Massachusetts Institute Of Technology Cyclic shrinkage of a templated 3D network material
JP2006119379A (ja) * 2004-10-21 2006-05-11 Sumitomo Electric Ind Ltd 光導波路デバイスの製造方法、および光導波路デバイス
DE102006022303B4 (de) 2006-05-11 2009-06-18 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas mit vorgegebenem Hydroxylgruppengehalt
DE102006034885A1 (de) 2006-07-25 2008-08-07 Daimlerchrysler Ag Wasserstoff- und Energiegewinnung durch thermische Umsetzung von Silanen
US20080050076A1 (en) * 2006-08-23 2008-02-28 Ming-Jun Li Low loss photonic waveguide having high index contrast glass layers
US7799711B2 (en) * 2007-08-31 2010-09-21 Corning Incorporated Photomachinable glass compositions having tunable photosensitivity
JP5003503B2 (ja) * 2008-01-17 2012-08-15 三菱電機株式会社 石英系ガラスの製造方法および光デバイスの製造方法
US8414970B2 (en) * 2008-02-15 2013-04-09 Guardian Industries Corp. Organosiloxane inclusive precursors having ring and/or cage-like structures for use in combustion deposition
US8729158B2 (en) 2008-09-05 2014-05-20 Cabot Corporation Fumed silica of controlled aggregate size and processes for manufacturing the same
US8038971B2 (en) 2008-09-05 2011-10-18 Cabot Corporation Fumed silica of controlled aggregate size and processes for manufacturing the same
GB2478307A (en) 2010-03-02 2011-09-07 Heraeus Quartz Uk Ltd Manufacture of silica glass
US8840858B2 (en) 2011-07-06 2014-09-23 Corning Incorporated Apparatus for mixing vaporized precursor and gas and method therefor
CN102320732A (zh) * 2011-08-25 2012-01-18 长飞光纤光缆有限公司 一种制备光纤预制棒的方法
US9630872B2 (en) 2011-09-29 2017-04-25 Sumitomo Electric Industries, Ltd. Method for manufacturing glass-fine-particle-deposited body and method for manufacturing glass base material
DE102011119339A1 (de) * 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Zerstäubungsverfahren zur Herstellung von synthetischem Quarzglas
DE102011119341A1 (de) * 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas nach der Sootmethode
DE102011119374A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
DE102011119373A1 (de) * 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
DE102011121190A1 (de) * 2011-12-16 2013-06-20 Heraeus Quarzglas Gmbh & Co. Kg OMCTS-Verdampfungsverfahren
TWI532815B (zh) * 2012-01-20 2016-05-11 先鋒材料科技股份有限公司 導熱、絕緣、耐燃及耐高溫之黏著劑及其組合物
DE102013202256B3 (de) * 2013-02-12 2014-07-17 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von Titan-dotiertem synthetischen Quarzglas und dessen Verwendung
JP6236866B2 (ja) * 2013-05-15 2017-11-29 住友電気工業株式会社 ガラス微粒子堆積体の製造方法およびガラス微粒子堆積体製造用バーナー
DE102013209673B3 (de) * 2013-05-24 2014-05-22 Heraeus Quarzglas Gmbh & Co. Kg Verfahren und Verdampfer zur Herstellung von synthetischem Quarzglas
DE102013110177A1 (de) * 2013-09-16 2015-03-19 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von Eisen-dotiertem Kieselglas
JP6814278B2 (ja) * 2016-07-18 2021-01-13 プリズミアン ソチエタ ペル アツィオーニ 光ファイバ製造に使用する二酸化珪素の母材を製造するための方法
CN106277750A (zh) * 2016-08-19 2017-01-04 中国建筑材料科学研究总院 石英玻璃的制备方法
EP3309126A1 (de) * 2016-10-11 2018-04-18 Evonik Degussa GmbH Verfahren zur herstellung von siliciumtetrachlorid durch carbochlorierung
EP3565784B1 (de) 2017-01-09 2020-11-11 Evonik Operations GmbH Verfahren zur herstellung metalloxiden mittels spraypyrolyse
CN106915898B (zh) * 2017-04-11 2019-07-23 湖北菲利华石英玻璃股份有限公司 一种大规格二氧化硅疏松体的生产方法
EP3424883A1 (de) 2017-07-05 2019-01-09 Evonik Degussa GmbH Sprühverdampfung eines flüssigen rohstoffes zur herstellung von siliciumdioxid und metalloxiden
EP3495321A1 (de) 2017-12-07 2019-06-12 Evonik Degussa GmbH Herstellung von pulverförmigen, porösen kristallinen metallsilikaten mittels flammensprühpyrolyse
EP3659964A1 (en) 2018-11-28 2020-06-03 Hysilabs, SAS Catalysed process of production of hydrogen from silylated derivatives as hydrogen carrier compounds
JP7428632B2 (ja) 2020-12-14 2024-02-06 信越化学工業株式会社 多孔質ガラス母材の製造方法及び製造装置

Family Cites Families (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2272342A (en) 1934-08-27 1942-02-10 Corning Glass Works Method of making a transparent article of silica
US2269059A (en) 1938-05-14 1942-01-06 Corning Glass Works Method of preparing finely comminuted oxides
BE438752A (en]) 1939-04-22
US3117838A (en) 1957-08-02 1964-01-14 Int Standard Electric Corp Manufacture of silica
US3086851A (en) 1957-10-10 1963-04-23 Degussa Burner for production of finely divided oxides
US3303115A (en) * 1962-05-31 1967-02-07 Corning Glass Works Methods for forming materials of high purity by fusion
US3416890A (en) 1965-12-16 1968-12-17 Owens Illinois Inc Process of producing oxides of metals and metalloids
US3823995A (en) * 1972-03-30 1974-07-16 Corning Glass Works Method of forming light focusing fiber waveguide
US3826560A (en) 1972-03-30 1974-07-30 Corning Glass Works Method of forming a light focusing fiber waveguide
US3806224A (en) * 1972-10-06 1974-04-23 Bell Telephone Labor Inc Optical transmission line
CA967173A (en) 1973-01-04 1975-05-06 Peter C. Schultz Fused oxide type glasses
US3932162A (en) * 1974-06-21 1976-01-13 Corning Glass Works Method of making glass optical waveguide
JPS5156641A (ja) * 1974-11-13 1976-05-18 Sumitomo Electric Industries Hikaridensoyofuaibaano seizohoho
DE2546162B1 (de) 1975-10-15 1976-09-23 Jenaer Glaswerk Schott & Gen Lichtleitfaser mit Brechungsindexgradient zur Nachrichtenuebertragung
JPS5263213A (en) 1975-11-20 1977-05-25 Komatsu Denshi Kinzoku Kk Process for preparing highhpurity transparent silica glass products
JPS5423614A (en) * 1977-07-22 1979-02-22 Asahi Glass Co Ltd Method of forming metal oxide coating layer on glass sheet surface
US4156689A (en) 1978-02-13 1979-05-29 General Electric Company Purification of hydrosilanes and siloxanes
JPS54145642A (en) 1978-05-09 1979-11-14 Tokushiyu Muki Zairiyou Kenkiy Method of manufacturing heat resisting semiiinorganic compound
DE2909815C2 (de) * 1979-03-13 1984-11-22 Wacker-Chemie GmbH, 8000 München Verfahren zur Herstellung von hochdispersem Siliciumdioxid
CA1136911A (en) 1979-10-25 1982-12-07 Takao Edahiro Optical transmission fiber and process for producing the same
CA1188895A (en) * 1980-09-11 1985-06-18 Shoichi Suto Fabrication methods of doped silica glass and optical fiber preform by using the doped silica glass
JPS57170835A (en) * 1981-04-15 1982-10-21 Nippon Telegr & Teleph Corp <Ntt> Manufacture of single-mode optical fiber
JPS583981A (ja) * 1981-06-30 1983-01-10 Moai:Kk 鉄七宝製品の製造法
JPS58151318A (ja) 1982-02-26 1983-09-08 Shin Etsu Chem Co Ltd 合成シリカおよびこれを含有してなる電子部品封止用樹脂組成物
JPS58213638A (ja) * 1982-06-04 1983-12-12 Nippon Telegr & Teleph Corp <Ntt> 光学系ガラス製造法におけるド−プ方法
JPS59455A (ja) * 1982-06-23 1984-01-05 旭化成株式会社 壁パネル
SE446055B (sv) * 1982-07-01 1986-08-11 Landstingens Inkopscentral Ikontinensskydd eller bloja med vesentligen rektanguler form
JPS5911536A (ja) * 1982-07-10 1984-01-21 Victor Co Of Japan Ltd 情報信号の記録媒体
US4501602A (en) * 1982-09-15 1985-02-26 Corning Glass Works Process for making sintered glasses and ceramics
US4472510A (en) * 1982-12-23 1984-09-18 Dow Corning Corporation Carbon-containing monolithic glasses and ceramics prepared by a sol-gel process
JPS59207845A (ja) * 1983-05-10 1984-11-26 Fujikura Ltd 光フアイバ母材の製法
JPS603017A (ja) * 1983-06-17 1985-01-09 Ricoh Co Ltd カナ漢字変換処理装置
JPS6090837A (ja) 1983-10-25 1985-05-22 Shin Etsu Chem Co Ltd 光伝送用石英ガラス母材の製造方法
JPS6090836A (ja) * 1983-10-25 1985-05-22 Shin Etsu Chem Co Ltd 合成石英の製造方法
JPS6090838A (ja) * 1983-10-25 1985-05-22 Shin Etsu Chem Co Ltd 光伝送用石英ガラス母材の製造方法
JPH0624987B2 (ja) * 1984-07-13 1994-04-06 旭硝子株式会社 多孔質石英ガラス母材合成用バーナ
US4689420A (en) 1985-11-19 1987-08-25 Dow Corning Corporation Process for preparation of cyclopolydiorganosiloxanes
US4810673A (en) 1986-09-18 1989-03-07 Texas Instruments Incorporated Oxide deposition method
JPH0791072B2 (ja) * 1987-06-15 1995-10-04 株式会社フジクラ 希土類元素ド−プガラスの製造方法
JPH01183421A (ja) 1988-01-19 1989-07-21 Shin Etsu Chem Co Ltd 石英ガラスの製造方法
JPH02145448A (ja) * 1988-11-25 1990-06-04 Furukawa Electric Co Ltd:The 光フアイバ母材の製造方法
GB8905966D0 (en) * 1989-03-15 1989-04-26 Tsl Group Plc Improved vitreous silica products
JPH03198338A (ja) * 1989-12-27 1991-08-29 Handotai Process Kenkyusho:Kk 気相成長膜の形成方法および半導体装置
DE4026379A1 (de) * 1990-08-21 1992-02-27 Vaw Ver Aluminium Werke Ag Verfahren zur herstellung von schichtsilikaten des magadiit-typs

Also Published As

Publication number Publication date
USRE39535E1 (en) 2007-04-03
TW224077B (en]) 1994-05-21
AU633206B2 (en) 1993-01-21
CA2037102A1 (en) 1992-02-17
EP0471139B1 (en) 1996-12-18
DE69123659T2 (de) 1997-06-05
EP0471139A2 (en) 1992-02-19
DE69123659D1 (de) 1997-01-30
JP2683727B2 (ja) 1997-12-03
JPH04270130A (ja) 1992-09-25
AU7535591A (en) 1992-02-27
US5043002A (en) 1991-08-27
EP0471139A3 (en) 1993-01-07

Similar Documents

Publication Publication Date Title
CA2037102C (en) Method of making fused silica
US5152819A (en) Method of making fused silica
US5154744A (en) Method of making titania-doped fused silica
US6312656B1 (en) Method for forming silica by combustion of liquid reactants using oxygen
EP0868401B1 (en) Method and apparatus for forming fused silica by combustion of liquid reactants
EP0463045B1 (en) Improved vitreous silica products
US5703191A (en) Method for purifying polyalkylsiloxanes and the resulting products
US5879649A (en) Method for purifying polyalkylsiloxanes and the resulting products
EP0973957A1 (en) Method of making titania-doped fused silica
US4564378A (en) Method for producing a preform for light waveguides
EP1332116A1 (en) Method for producing bulk fused silica
AU638702C (en) Vitreous silica products
MXPA98004935A (en) Method and apparatus for forming fused silice through the combustion of liqui reagents
JPH0459253B2 (en])

Legal Events

Date Code Title Description
EEER Examination request
MKLA Lapsed